Material |
X |
Thickness (nm) |
Dopant |
Doping concentration |
InP |
|
1000 |
N (Sulfur) |
3.00E+16 |
In(x)GaAs |
0.53 |
3000 |
U/D |
5.00E+14 |
InP |
|
500 |
N (Sulfur) |
3.00E+16 |
Substrate |
|
|
SI (Fe) |
|